Silicon technologies : ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Άλλοι συγγραφείς: | |
---|---|
Μορφή: | Ηλ. βιβλίο |
Γλώσσα: | English |
Έκδοση: |
London :
ISTE ;
2011.
Hoboken, NJ : Wiley, 2011. |
Θέματα: | |
Διαθέσιμο Online: | Full Text via HEAL-Link |
LEADER | 03035nam a2200733 4500 | ||
---|---|---|---|
001 | ocn828672185 | ||
003 | OCoLC | ||
005 | 20170124070621.5 | ||
006 | m o d | ||
007 | cr cnu---unuuu | ||
008 | 130228s2011 enka ob 001 0 eng d | ||
040 | |a N$T |b eng |e pn |c N$T |d E7B |d DG1 |d IDEBK |d UMI |d COO |d DEBBG |d YDXCP |d OCLCQ |d OCLCF |d DEBSZ |d OCLCQ |d LOA |d OCLCQ |d GrThAP | ||
019 | |a 858949398 |a 960200541 |a 961601119 |a 962586146 | ||
020 | |a 9781118601044 |q (electronic bk.) | ||
020 | |a 1118601041 |q (electronic bk.) | ||
020 | |a 9781118601112 |q (electronic bk.) | ||
020 | |a 1118601114 |q (electronic bk.) | ||
020 | |a 9781118601143 | ||
020 | |a 1118601149 | ||
020 | |z 9781848212312 | ||
020 | |z 1848212313 | ||
029 | 1 | |a AU@ |b 000052007527 | |
029 | 1 | |a DEBBG |b BV041432444 | |
029 | 1 | |a DEBBG |b BV041906305 | |
029 | 1 | |a DEBBG |b BV043395514 | |
029 | 1 | |a DEBSZ |b 398283605 | |
029 | 1 | |a DKDLA |b 820120-katalog:000696495 | |
029 | 1 | |a NZ1 |b 15916398 | |
035 | |a (OCoLC)828672185 |z (OCoLC)858949398 |z (OCoLC)960200541 |z (OCoLC)961601119 |z (OCoLC)962586146 | ||
037 | |a CL0500000292 |b Safari Books Online | ||
050 | 4 | |a TK7871.85 | |
072 | 7 | |a TEC |x 008090 |2 bisacsh | |
072 | 7 | |a TEC |x 008100 |2 bisacsh | |
082 | 0 | 4 | |a 621.3815/2 |2 23 |
049 | |a MAIN | ||
245 | 0 | 0 | |a Silicon technologies : |b ion implantation and thermal treatment / |c edited by Annie Baudrant. |
264 | 1 | |a London : |b ISTE ; |c 2011. | |
264 | 1 | |a Hoboken, NJ : |b Wiley, |c 2011. | |
300 | |a 1 online resource : |b illustrations | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
500 | |a Title from PDF title page (viewed on Feb. 28, 2013). | ||
504 | |a Includes bibliographical references and index. | ||
520 | |a The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. | ||
650 | 0 | |a Semiconductor doping. | |
650 | 0 | |a Ion implantation. | |
650 | 0 | |a Semiconductors |x Heat treatment. | |
650 | 4 | |a Semiconductor doping. | |
650 | 4 | |a Ion implantation. | |
650 | 4 | |a Semiconductors |x Heat treatment. | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Semiconductors. |2 bisacsh | |
650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Solid State. |2 bisacsh | |
650 | 7 | |a Ion implantation. |2 fast |0 (OCoLC)fst00978590 | |
650 | 7 | |a Semiconductor doping. |2 fast |0 (OCoLC)fst01112124 | |
650 | 7 | |a Semiconductors |x Heat treatment. |2 fast |0 (OCoLC)fst01112224 | |
650 | 7 | |a Semiconductor doping. |2 local | |
650 | 7 | |a Ion implantation. |2 local | |
650 | 7 | |a Semiconductors / Heat treatment. |2 local | |
655 | 4 | |a Electronic books. | |
700 | 1 | |a Baudrant, Annie. | |
776 | 0 | 8 | |i Print version: |t Silicon technologies. |d London : ISTE ; Hoboken, NJ : Wiley, 2011 |z 9781848212312 |w (DLC) 2011008131 |w (OCoLC)669751158 |
856 | 4 | 0 | |u https://doi.org/10.1002/9781118601044 |z Full Text via HEAL-Link |
994 | |a 92 |b DG1 |