Silicon technologies : ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
| Άλλοι συγγραφείς: | |
|---|---|
| Μορφή: | Ηλ. βιβλίο |
| Γλώσσα: | English |
| Έκδοση: |
London :
ISTE ;
2011.
Hoboken, NJ : Wiley, 2011. |
| Θέματα: | |
| Διαθέσιμο Online: | Full Text via HEAL-Link |
