Silicon technologies : ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Other Authors: | Baudrant, Annie |
---|---|
Format: | eBook |
Language: | English |
Published: |
London :
ISTE ;
2011.
Hoboken, NJ : Wiley, 2011. |
Subjects: | |
Online Access: | Full Text via HEAL-Link |
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