Nano-lithography /
Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and el...
| Άλλοι συγγραφείς: | |
|---|---|
| Μορφή: | Ηλ. βιβλίο |
| Γλώσσα: | English |
| Έκδοση: |
London :
Wiley,
2013.
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| Σειρά: | ISTE.
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| Θέματα: | |
| Διαθέσιμο Online: | Full Text via HEAL-Link |
Πίνακας περιεχομένων:
- Cover; Title Page; Copyright Page; Table of Contents; 6.4.2. Three-dimensionnal AFM (AFM3D) special features; Foreword; Introduction; Chapter 1. X-ray Lithography: Fundamentals and Applications; 1.1. Introduction; 1.2. The principle of X-ray lithography; 1.2.1. The irradiation system for XRL; 1.2.2. Properties of synchrotron radiation; 1.2.3. High Resolution and Deep XRL; 1.2.4. Examples of X-ray lithography beamlines; 1.2.5. Scanner/stepper; 1.2.6. The mask; 1.3. The physics of X-ray lithography; 1.3.1. How phase and intensity of X-rays are altered by interaction with matter.
- 1.3.2. X-ray lithography as a shadow printing technique1.3.3. X-ray absorption in a resist and physical mechanisms involved in its exposure; 1.3.4. Physical model of electron energy loss in resists; 1.3.5. Diffraction effects in X-ray lithography; 1.3.6. Coherence of synchrotron radiation from bending magnet devices; 1.3.7. Basic formulation of diffraction theory for a scalar field; 1.3.8. Rayleigh-Sommerfeld formulation of diffraction by a planar screen; 1.3.9. An example of diffraction effects: Poisson's spot in X-ray lithography; 6.3. Scanning electron microscopy (SEM); 1.4. Applications.
- 1.4.1. Optimal photon energy range for high resolution and deep X-ray lithography1.4.2. Diffraction effects on proximity lithography; 1.4.3. High resolution 3D nano structuring; 1.4.4. 3D polymer structures by combination of NanoImprint (NIL) and X-ray lithography (XRL); 1.4.5. Micromachining and the LIGA process; 1.4.9. Micro-optical element for distance measurement; 1.5. Appendix 1; 1.6. Bibliography; Chapter 2. NanoImprint Lithography; 2.1. From printing to NanoImprint; 2.2. A few words about NanoImprint; 2.3. The fabrication of the mold.
- 2.4. Separating the mold and the resist after imprint: de-embossing2.4.1. The problem; 2.4.2. Adhesion; 2.4.3. Adhesion and physico-chemical surface properties; 2.4.4. Surface treatment of the mold; 2.4.5. Treatment of the resist; 2.4.6. Characterization of the demolding process; 2.5. The residual layer problem in NanoImprint; 2.5.1. The residual layer: a NanoImprint specific issue; 2.5.2. Is the thickness of the residual layer predictable?; 2.5.3. How can the process impact the thickness of the residual layer?; 2.6. Residual layer thickness measurement.
- 2.6.1. Macro-scale approach: coherence between film color and thickness2.6.2. Microscopic approach; 2.7. A few remarks on the mechanical behavior of molds and flow properties of the nanoimprint process; 2.8. Conclusion; 2.9. Bibliography; Chapter 3. Lithography Techniques Using Scanning Probe Microscopy; 3.1. Introduction; 3.2. Presentation of local-probe microscopes; 3.3. General principles of local-probe lithography techniques; 3.4. Classification of surface structuring techniques using local-probe microscopes; 3.4.1. Classification according to the physical nature of the interaction.
