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03209nam a2200829 4500 |
| 001 |
ocn841199237 |
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OCoLC |
| 005 |
20170124071502.7 |
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m o d |
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cr ||||||||||| |
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130423s2013 mau ob 001 0 eng |
| 010 |
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|a 2013016681
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| 040 |
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|a DLC
|b eng
|e rda
|e pn
|c DLC
|d N$T
|d DG1
|d IDEBK
|d CUS
|d E7B
|d COO
|d NOC
|d B24X7
|d HEBIS
|d OCLCF
|d YDXCP
|d OCLCQ
|d S3O
|d GrThAP
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| 019 |
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|a 961668112
|a 962576539
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|a 9781118747384
|q (epub)
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|a 1118747380
|q (epub)
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|a 9781118747421
|q (pdf)
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|a 1118747429
|q (pdf)
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|a 9781118747346
|q (mobi)
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| 020 |
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|a 1118747348
|q (mobi)
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| 020 |
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|a 9781118747407
|q (electronic bk.)
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| 020 |
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|a 1118747402
|q (electronic bk.)
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| 020 |
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|a 9781299619128
|q (MyiLibrary)
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| 020 |
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|a 1299619126
|q (MyiLibrary)
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| 020 |
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|z 9781118062777
|q (cloth ;
|q alk. paper)
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| 020 |
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|z 1118062779
|q (cloth ;
|q alk. paper)
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| 029 |
1 |
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|a AU@
|b 000053297848
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| 029 |
1 |
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|a CHBIS
|b 010026644
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1 |
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| 029 |
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|a DKDLA
|b 820120-katalog:000652718
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| 029 |
1 |
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|a GBVCP
|b 790208075
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| 029 |
1 |
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|a NZ1
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| 029 |
1 |
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|a AU@
|b 000058064304
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| 029 |
1 |
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|a DEBBG
|b BV043395788
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| 035 |
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|a (OCoLC)841199237
|z (OCoLC)961668112
|z (OCoLC)962576539
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| 042 |
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|a pcc
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| 050 |
0 |
0 |
|a TS695
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| 072 |
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7 |
|a SCI
|x 050000
|2 bisacsh
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| 072 |
|
7 |
|a TEC
|x 027000
|2 bisacsh
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| 082 |
0 |
0 |
|a 620/.5
|2 23
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| 049 |
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|a MAIN
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| 100 |
1 |
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|a Kääriäinen, Tommi.
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| 245 |
1 |
0 |
|a Atomic layer deposition :
|b principles, characteristics, and nanotechnology applications /
|c Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.
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| 250 |
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|a 2nd edition.
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| 264 |
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1 |
|a Salem, Massachusetts :
|b Scrivener Publishing, LLC ;
|a Hoboken, New Jersey :
|b Wiley,
|c [2013]
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| 300 |
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|a 1 online resource.
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| 336 |
|
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|a text
|b txt
|2 rdacontent
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| 337 |
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|a computer
|b c
|2 rdamedia
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| 338 |
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|a online resource
|b cr
|2 rdacarrier
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| 504 |
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|a Includes bibliographical references and index.
|
| 588 |
0 |
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|a Print version record and CIP data provided by publisher.
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| 650 |
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0 |
|a Chemical vapor deposition.
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| 650 |
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0 |
|a Epitaxy.
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| 650 |
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0 |
|a Microelectronics.
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| 650 |
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0 |
|a Nanotechnology.
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| 650 |
|
7 |
|a SCIENCE
|x Nanoscience.
|2 bisacsh
|
| 650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Nanotechnology & MEMS.
|2 bisacsh
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| 650 |
|
7 |
|a Chemical vapor deposition.
|2 fast
|0 (OCoLC)fst00853229
|
| 650 |
|
7 |
|a Epitaxy.
|2 fast
|0 (OCoLC)fst00914372
|
| 650 |
|
7 |
|a Microelectronics.
|2 fast
|0 (OCoLC)fst01019757
|
| 650 |
|
7 |
|a Nanotechnology.
|2 fast
|0 (OCoLC)fst01032639
|
| 650 |
|
7 |
|a Nanotechnologie
|2 gnd
|0 (DE-588)4327470-5
|
| 650 |
|
7 |
|a Atomlagenabscheidung
|2 gnd
|0 (DE-588)7712127-2
|
| 650 |
|
7 |
|a Mikroelektromekaniska system.
|2 sao
|
| 655 |
|
4 |
|a Electronic books.
|
| 655 |
|
7 |
|a Electronic books.
|2 local
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| 700 |
1 |
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|a Cameron, David,
|d 1949-
|
| 700 |
1 |
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|a Kääriäinen, Marja-Leena.
|
| 700 |
1 |
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|a Sherman, Arthur,
|d 1931-
|
| 776 |
0 |
8 |
|i Print version:
|a Kääriäinen, Tommi.
|t Atomic layer deposition.
|d Hoboken, New Jersey : John Wiley & Sons, [2013]
|z 9781118062777
|w (DLC) 2013016209
|
| 856 |
4 |
0 |
|u https://doi.org/10.1002/9781118747407
|z Full Text via HEAL-Link
|
| 994 |
|
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|a 92
|b DG1
|
